Polysaccharide Mask for Sensitive Skin is produced by the Ukrainian beauty brand Agor. It is specifically designed for highly sensitive and allergy-prone skin. The product is formulated with 100% natural ingredients. Free of fragrances, colourants, preservatives.
The mask has a combined effect. It copes with irritation, itching, rashes and inflammation, stimulates the regeneration of damaged skin, strengthens capillary walls, reduces skin sensitivity, helps to get rid of toxins and has an antioxidant effect.
The product contains pectin which has astringent, soothing and light exfoliating properties. It stimulates the skin's natural protective mechanisms, copes with inflammation, accelerates the healing of minor skin injuries.
Agar has a pronounced cleansing effect and helps to eliminate blackheads due to its sorbent properties. It also has a detoxifying effect, helps to cope with acne, soothes the skin irritated by allergic reactions.
Chamomile extract soothes the skin, eliminates inflammation, itching and redness, protects the skin from harmful environmental factors. It also helps to normalise the hydro-lipid balance of the skin, enhances the skin's protective properties and reduces sensitivity.
Plantain extract has rejuvenating, healing and cleansing properties. It provides an anti-age effect. The extract helps to reduce inflammation and skin pore size, eliminates blackheads, makes the skin smoother.
Designed for sensitive and problem skin.
Directions. Mix 1.5 g mask with 20 ml warm (40-50°С) water. Stir well to obtain a homogeneous gel. Apply onto cleansed skin and leave for 15-20 minutes. Rinse with cool water. 1 container is designed for 5 applications. Use 2 times a week for 3-4 weeks or as needed.
Ingredients. Pectin, agar, tapioca starch, chamomile extract, plantain extract.
Want to buy Polysaccharide Mask for Sensitive Skin? Call us or submit your order via our web site!
